Method and device for measuring an ion flow in a plasma
US5936413A · kind A · utility
38Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 8, 1997 |
| Grant date | Aug 10, 1999 |
| Priority date | — |
| Expiry date | Aug 8, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/0081
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention relates to a method for measuring an ion flow from a plasma to a surface in contact therewith, consisting of measuring the rate of discharge of a measuring capacitor connected between a radiofrequency voltage source and a plate-shaped probe in contact with the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.