Jean-Paul Booth
16Patents
5h-index
14Co-inventors
63Inventor score
Filing activity: Aug 8, 1997 → Nov 8, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5936413A | Method and device for measuring an ion flow in a plasma | Electricity | 38 | Expired |
| US8144328B2 | Methods and apparatus for normalizing optical emission spectra | Physics | 10 | Active |
| US8358416B2 | Methods and apparatus for normalizing optical emission spectra | Physics | 9 | Active |
| US8164349B2 | Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof | Electricity | 5 | Active |
| US9129779B2 | Processing system for detecting in-situ arcing events during substrate processing | Electricity | 5 | Active |
| US8179152B2 | Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting plasma instabilities in a plasma processing chamber | Electricity | 5 | Active |
| US8159233B2 | Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting in-situ arcing events in a plasma processing chamber | Electricity | 3 | Active |
| US9153421B2 | Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamber | Electricity | 3 | Active |
| US8547085B2 | Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber | Electricity | 3 | Active |
| US8780522B2 | Capacitively-coupled electrostatic (CCE) probe arrangement for detecting dechucking in a plasma processing chamber and methods thereof | Electricity | 2 | Active |
| US8164353B2 | RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamber | Emerging Cross-Sectional Technologies | 1 | Active |
| US8968838B2 | Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation | Electricity | 1 | Active |
| US8849585B2 | Methods for automatically characterizing a plasma | Electricity | 1 | Active |
| US10319565B2 | Method and system for controlling ion flux in an RF plasma | Electricity | 1 | Active |
| US10796885B2 | Circuit for impedance matching between a generator and a load at multiple frequencies, assembly comprising such a circuit and related use | Electricity | 0 | Active |
| US8894804B2 | Plasma unconfinement sensor and methods thereof | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.