Method and device for producing features on a photolithographic layer

US5936713A · kind A · utility

Assignee

• Max-Planck-Gesellschaft zur Föderung der Wissenschaften e.V. · US

Inventors

• Jorg Paufler · Bischofswerda, DE
• Rolf Seltmann · Dresden, DE
• Heinz Kück · Stuttgart, DE

Key dates

• Filing date: Jan 29, 1998
• Grant date: Aug 10, 1999
• Expiry date: Jan 29, 2018

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70291
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

In a method for structuring a photolithographic layer a first pattern is ated on a first plane light modulator. The first plane light modulator comprises a plurality of picture elements, and the first pattern is defined by a prescribed number of addressed picture elements. Then a second pattern is created on a second plane light modulator. The second plane light modulator comprises a plurality of picture elements, and the second pattern has a first region of addressed picture elements, which matches the first pattern or part thereof, and immediately adjacent to this a second region of addressed picture elements. Finally the first and the second pattern are imaged onto a region to be exposed of the layer to be structured.