Rolf Seltmann
13Patents
5h-index
23Co-inventors
66Inventor score
Filing activity: Jun 27, 1994 → Jul 5, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5496669A | System for detecting a latent image using an alignment apparatus | Physics | 58 | Expired |
| US7842442B2 | Method and system for reducing overlay errors within exposure fields by APC control strategies | Physics | 20 | Active |
| US7325224B2 | Method and system for increasing product yield by controlling lithography on the basis of electrical speed data | Physics | 13 | Expired |
| US5936713A | Method and device for producing features on a photolithographic layer | Physics | 12 | Expired |
| US6493063B1 | Critical dimension control improvement method for step and scan photolithography | Physics | 8 | Expired |
| US8605250B2 | Method and system for detecting particle contamination in an immersion lithography tool | Physics | 3 | Active |
| US8039181B2 | Method and system for reducing overlay errors in semiconductor volume production using a mixed tool scenario | Physics | 3 | Active |
| US8155770B2 | Method and apparatus for dispatching workpieces to tools based on processing and performance history | Emerging Cross-Sectional Technologies | 3 | Active |
| US7006195B2 | Method and system for improving exposure uniformity in a step and repeat process | Physics | 2 | Expired |
| US6946411B2 | Method and system for improving the efficiency of a mechanical alignment tool | Emerging Cross-Sectional Technologies | 2 | Expired |
| US7618755B2 | Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields | Physics | 2 | Active |
| US8332783B2 | Control of critical dimensions in optical imaging processes for semiconductor production by extracting imaging imperfections on the basis of imaging tool specific intensity measurements and simulations | Physics | 0 | Active |
| US9966315B2 | Advanced process control methods for process-aware dimension targeting | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.