Heat treatment apparatus
US5942012A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 7, 1996 |
| Grant date | Aug 24, 1999 |
| Priority date | — |
| Expiry date | Jun 7, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67781
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
One lot is a group of wafers-to-be-processed in one wafer carrier, and one lot region for one lot is allocated fixed to a holding region of a wafer boat. A variable lot region mode in which lot regions for 4, for example, lots are allocated to the wafer boat. When a lot number is less than 4, or numbers of sheets of wafers-to-be-processed in the respective lots are less than a prescribed number, the lot regions can be compressed, centered on a number of a set holding groove is prepared. On the other hand, in connection with transfer of monitor wafers, a mode in which monitor wafers are transferred to inter-lot regions, and a mode in which numbers of holding grooves can be designated are prepared. The former mode is selected in product monitor, and the latter mode is selected in apparatus monitor. The fixed lot region mode in which the respective lots correspond to their holding regions irrespective of numbers of sheets of wafers in the carriers, and the variable lot region mode in which wafers-to-be-processed are transferred to both sides of a designated number of holding groove can be selected by switches. The fixed lot region mode includes a first fixed lot region mode in which w…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.