Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
US5942367A · kind A · utility
46Cited by
9References
19Claims
0Family size
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Key dates
| Filing date | Apr 23, 1997 |
| Grant date | Aug 24, 1999 |
| Priority date | — |
| Expiry date | Apr 23, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group .tbd.C--COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.