Apparatus for preventing particle deposition in a capacitance diaphragm gauge
US5948169A · kind A · utility
18Cited by
2References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 11, 1998 |
| Grant date | Sep 7, 1999 |
| Priority date | — |
| Expiry date | Mar 11, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus for reducing a material deposition in a housing is disclosed herein. The apparatus includes: a first pressure sensing device which senses a pressure in a reaction chamber, a pumping device for pumping the vapor from the reaction chamber to the pumping device, a valve that is opened when the pressure is larger than a first value and smaller than a second value, a bypass valve which is closed when the pressure is larger than the third value and smaller than the fourth value, a check valve that blocks a gas flow from the check valve to the bypass valve, and a pipe for connecting all of the above.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.