Vapor feed supply system
US5950646A · kind A · utility
11Cited by
8References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 8, 1998 |
| Grant date | Sep 14, 1999 |
| Priority date | — |
| Expiry date | Jan 8, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vapor feed supply system including a vaporizer device and a method of cleaning a vapor flow region employing such a vaporizer device enables thorough cleaning of the system, without having to degrade the overall system vacuum in the process of cleaning the vaporizer device. The method includes defining a cleaning fluid passage having a predetermined withstand pressure by isolating a cleaning region of the vapor flow region, and flowing a cleaning fluid into the cleaning fluid passage under a pressure so as to enable the cleaning fluid to remain in a liquid state at a cleaning temperature of the cleaning region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.