Vaporizer apparatus and film deposition apparatus therewith
US5951923A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 22, 1997 |
| Grant date | Sep 14, 1999 |
| Priority date | — |
| Expiry date | May 22, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S261/65
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A vaporizer apparatus efficiently vaporizes difficult-to-vaporize materials such as complex feed materials for producing a high dielectric or ferroelectric material. The vaporizer apparatus includes a vaporizing passage formed by a pair of opposed walls separated by a minute spacing to a liquid feed entrance provided at one end of the vaporizing passage, a vaporized feed exit provided at an opposite end of the vaporizing passage, and a heating arrangement for heating the walls to a temperature in excess of a vaporizing temperature of the liquid feed so that the liquid feed material may be guided into the vaporizing passage to be vaporized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.