Method and system for judging milling end point for use in charged particle beam milling system
US5952658A · kind A · utility
23Cited by
9References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 18, 1997 |
| Grant date | Sep 14, 1999 |
| Priority date | — |
| Expiry date | Apr 18, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30466
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam milling system which is designed in such a way that a milling end point is judged to stop the milling on the basis of a change in the magnitude of secondary ion signals generated when milling an electronic device such as an LSI having a multi-wiring layer structure, in which a wiring layer and an insulating layer are laminated, using a charged particle beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.