X-ray mask blank and method of manufacturing the same
US5958627A · kind A · utility
3Cited by
5References
24Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 21, 1997 |
| Grant date | Sep 28, 1999 |
| Priority date | — |
| Expiry date | Mar 21, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An X-ray mask blank (25) comprises a substrate (23), an X-ray transparent film (29), and an X-ray absorber film (27). The X-ray absorber film has a surface roughness within a range not more than 2.0 mmRa. Ra represents a center line average height. The X-ray absorber film exhibits a stress between 0 and .+-.10 MPa at a plurality of points on a predetermined area. Preferably, the X-ray mask blank is specified by a product of a stress and a thickness, both of which are measured at the same points. The product falls within a range between 0 and .+-.5.times.10.sup.3 dyn/cm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.