Methods of depositing films on polymer substrates
US5962083A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 13, 1996 |
| Grant date | Oct 5, 1999 |
| Priority date | — |
| Expiry date | Jun 13, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32678
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of depositing a thin film on a polymer substrate by plasma CVD comprises applying a magnetic field to a plasma generating chamber by activating a magnetic coil placed in the circumference of the plasma generating chamber, the plasma generating chamber having an inlet; introducing a microwave into the plasma generating chamber; introducing an upstream gas into the plasma generating chamber wherein an ECR plasma is generated; vaporizing a feed gas wherein a supply gas is generated and carries the ECR plasma; passing said ECR plasma through a mesh provided between the inlet and a polymer substrate located downstream of the inlet; and depositing a film on the surface of the polymer substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.