Cleaning liquid for semiconductor devices
US5962385A · kind A · utility
38Cited by
6References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 13, 1998 |
| Grant date | Oct 5, 1999 |
| Priority date | — |
| Expiry date | Aug 13, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02071
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A cleaning liquid for semiconductor devices comprising 1.0 to 5% by weight of a fluorine compound of the formula R.sub.4 NF, wherein R is a hydrogen atom or a C.sub.1 -C.sub.4 alkyl group, 72 to 80% by weight of an organic solvent soluble in water, and the remaining amount being water. The cleaning liquid can rapidly and completely at a low temperature remove resist residues left remaining after dry etching and ashing in the wiring step in the production of semiconductor integrated circuits, and the cleaning liquid does not corrode wiring materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.