Configurations, materials and wavelengths for EUV lithium plasma discharge lamps
US5963616A · kind A · utility
76Cited by
10References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 11, 1997 |
| Grant date | Oct 5, 1999 |
| Priority date | — |
| Expiry date | Mar 11, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J61/30
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
This invention relates to Lithium Plasma discharge sources, and in particular to methods of making and producing pulsed and continuous discharge sources for plasma soft-x-ray or EUV projection lithography. Specifically, novel configurations, metal and ceramic material combinations and efficient wavelengths over and including 11.4 nm are disclosed for EUV lithium plasma discharge lamps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.