Marc Klosner
11Patents
7h-index
11Co-inventors
59Inventor score
Filing activity: Mar 11, 1997 → Jul 22, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5963616A | Configurations, materials and wavelengths for EUV lithium plasma discharge lamps | Electricity | 76 | Expired |
| US6621044B2 | Dual-beam materials-processing system | Physics | 71 | Expired |
| US6238852A | Maskless lithography system and method with doubled throughput | Physics | 66 | Expired |
| US6416908B1 | Projection lithography on curved substrates | Physics | 35 | Expired |
| US7164465B2 | Versatile maskless lithography system with multiple resolutions | Physics | 11 | Expired |
| US6188076A | Discharge lamp sources apparatus and methods | Electricity | 10 | Expired |
| US7670727B2 | Illumination compensator for curved surface lithography | Physics | 7 | Active |
| US8494012B2 | Raman converting laser systems | Electricity | 4 | Active |
| US7106415B2 | Illumination compensator for curved surface lithography | Physics | 3 | Expired |
| US7158305B2 | Illumination system optimized for throughput and manufacturability | Physics | 3 | Expired |
| US8942265B2 | Raman converting laser systems | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.