Temperature calibration substrate
US5967661A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 2, 1997 |
| Grant date | Oct 19, 1999 |
| Priority date | — |
| Expiry date | Jun 2, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01K15/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for measuring the temperature of an object within a process chamber is described. The process chamber includes a platform for receiving the object and an energy source for transferring energy to the object. The apparatus includes a shield, and a first and second energy sensor. The shield is positioned in the chamber adjacent the object to create an isothermal cavity in the space between the object and the shield. The shield is designed to receive from the energy source an amount of energy approximating that received by the object. The first energy sensor is positioned between the shield and the platform to measure the temperature of the object. The second energy sensor measures the temperature of the shield. A method for establishing an isothermal condition within the process chamber includes the steps of varying the shield temperature in inverse relationship to the difference between the shield temperature and a target temperature. Then the temperature of the object is valued in inverse relationship to the difference between the temperature of a cavity sensor and the target temperature. When the readings are within a predetermined range of the target temperature an is…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.