SiC semiconductor device comprising a pn junction with a voltage absorbing edge
US5967795A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 30, 1995 |
| Grant date | Oct 19, 1999 |
| Priority date | — |
| Expiry date | Aug 30, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/931
Abstract
A semiconductor component comprises a pn junction in which both the p-conducting and the n-conducting layers of the pn junction are doped silicon carbide layers and the edge of at least one of the conducting layers of the pn junction exhibits a stepwise or uniformly decreasing total charge or effective surface charge density from the initial value at the defined working junction to a zero or almost zero total charge at the outermost edge of the junction following a radial direction from the central part of the junction towards its outermost edge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.