Method of sputtering selected oxides and nitrides for forming magnetic media
US5976326A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 28, 1997 |
| Grant date | Nov 2, 1999 |
| Priority date | — |
| Expiry date | Aug 28, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F41/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A Co--Pt based magnetic alloy which has been sputtered with an oxide or nitride of a primary constituent of the magnetic layer, e.g., CoO below about 10 at. %, provides improved coercivity, squareness, and reduced noise as compared to magnetic alloys with oxygen introduced by other methods. The alloy is vacuum deposited, for example, by sputtering, and the oxide or nitride may be introduced from the sputtering target from which the magnetic layer materials come or from a separate sputtering target. Examples of such oxides and nitrides include CoO, Co.sub.2 0.sub.3, Co.sub.3 O.sub.4, CrO.sub.2, Cr.sub.2 O.sub.3, TiO.sub.2, Ta.sub.2 O.sub.5, Al.sub.2 O.sub.3, WO, CoN, Co.sub.2 N, TiN, TaN, CrN, NiN, etc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.