Method of supplying excited oxygen
US5976992A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 27, 1994 |
| Grant date | Nov 2, 1999 |
| Priority date | — |
| Expiry date | Sep 27, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32357
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of supplying an excited oxygen, which comprises the steps of exciting a oxygen gas or a gas containing an oxygen atoms with plasma in a plasma discharge zone thereby forming an excited oxygen, and transferring a gas containing the excited oxygen into a reaction zone disposed next to the plasma discharge zone while keeping a pressure within the plasma discharge zone lower than that of the reaction zone. In a reaction chamber, a reaction by the excited oxygen is effected. As a result, the formation of a thin film on a substrate disposed in a reaction chamber, the etching of the substrate and the cleaning of the interior of the reaction chamber can be carried out.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.