SiC Semiconductor device comprising a pn Junction with a voltage absorbing edge
US5977605A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 20, 1997 |
| Grant date | Nov 2, 1999 |
| Priority date | — |
| Expiry date | Oct 20, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/931
Abstract
A semiconductor component, which comprises a pn junction, where both the p-conducting and the n-conducting layers of the pn junction constitute doped silicon carbide layers and where the edge of at least one of the conducting layers of the pn junction, exhibits a stepwise or uniformly decreasing total charge or effective surface charge density from the initial value at the defined working junction to a zero or almost zero total charge at the outermost edge of the junction following a radial direction from the central part of the junction towards the outermost edge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.