Adaptive inspection method and system
US5978501A · kind A · utility
44Cited by
10References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 3, 1997 |
| Grant date | Nov 2, 1999 |
| Priority date | — |
| Expiry date | Jan 3, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and system for detecting defects in the design of a photolithographic mask or a printed wafer. It derives an adaptive inspection algorithm that allows for a tighter inspection of a mask to a data set which has repeatable differences. The inspection should allow flexibility to remove un-important differences while maintaining a tight inspection capability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.