David S. O'Grady
11Patents
7h-index
18Co-inventors
55Inventor score
Filing activity: Jan 23, 1995 → Sep 10, 1999
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5807649A | Lithographic patterning method and mask set therefor with light field trim mask | Physics | 129 | Expired |
| US5503951A | Attenuating phase-shift mask structure and fabrication method | Physics | 64 | Expired |
| US5932377A | Exact transmission balanced alternating phase-shifting mask for photolithography | Physics | 58 | Expired |
| US5978501A | Adaptive inspection method and system | Physics | 44 | Expired |
| US5506080A | Lithographic mask repair and fabrication method | Physics | 14 | Expired |
| US5484672A | Method of making a rim-type phase-shift mask | Electricity | 14 | Expired |
| US6110624A | Multiple polarity mask exposure method | Electricity | 9 | Expired |
| US6027837A | Method for tuning an attenuating phase shift mask | Physics | 5 | Expired |
| US6277527A | Method of making a twin alternating phase shift mask | Physics | 5 | Expired |
| US6110623A | Surface coating method to highlight transparent mask defects | Physics | 3 | Expired |
| US6165651A | Apparatus for tuning an attenuating phase shift mask | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.