Electron beam exposure apparatus
US5981954A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 14, 1998 |
| Grant date | Nov 9, 1999 |
| Priority date | — |
| Expiry date | Jan 14, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/304
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam exposure apparatus, which has an electron source for emitting an electron beam, and an irradiation electron optical system which is arranged between the electron source and a first object, including a portion for transmitting an electron beam, and includes a plurality of electron lenses, and projects the electron beam transmitted through the first object onto a second object to expose it via a reduction electron optical system, acquires information associated with the intensity distribution of the electron beams to be irradiated onto the first object, and adjusts the electron optical characteristics of the irradiation electron optical system on the basis of the acquired information associated with the intensity distribution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.