Charged-particle source, control system, and process using gating to extract the ion beam
US5982101A · kind A · utility
6Cited by
4References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 27, 1997 |
| Grant date | Nov 9, 1999 |
| Priority date | — |
| Expiry date | Jun 27, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J27/022
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A control system and process for operating a charged-particle source which achieves gating of the charged-particle beam without a mechanical shutter and with very short transition between the beam "on" and beam "off" states is presented. The process and control system provide very precise control of the duration of the charged-particle extraction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.