Wafer holding and orienting fixture for optical profilometry
US5986753A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 9, 1998 |
| Grant date | Nov 16, 1999 |
| Priority date | — |
| Expiry date | Mar 9, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B5/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical profilometer having a movable head for measurement of the profile of a surface of a wafer under test in response to an optical beam projected by the head and incident onto the surface. The wafer may be a substrate for a data storage disc, and the surface may be one of a plurality of surfaces of the wafer, including the side face, the edge, and a radius or bevel therebetween. A fixture for holding the wafer includes a frame for orienting the wafer and also pivotally rotating the wafer about an axis. A vacuum chuck holds the wafer on the frame. An actuator orients the fixture frame in an plurality of positions spaced angularly about the axis to present selected ones of the wafer surfaces to the beam for profile measurement. Wafers of various diameters may be accommodated on the fixture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.