Photomask arrangement protecting reticle patterns from electrostatic discharge damage (ESD)
US5989754A · kind A · utility
27Cited by
3References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 5, 1997 |
| Grant date | Nov 23, 1999 |
| Priority date | — |
| Expiry date | Sep 5, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/40
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask arrangement is disclosed to prevent the reticle patterns of a photomask from peeling caused by electrostatic discharge damage. The photomask includes: a substrate; a plurality of metal shielding layers formed on the surface of the substrate to provide the reticle patterns, wherein each two of the metal shielding layers are spaced apart by a clear scribe line; and a plurality of metal lines formed on the clear scribe line to connect the adjacent metal shielding layers, thereby increasing the effective surface area of the reticle patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.