Method of manufacturing x-ray mask blank and method of manufacturing x-ray membrane for x-ray mask
US5989755A · kind A · utility
4Cited by
2References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 31, 1998 |
| Grant date | Nov 23, 1999 |
| Priority date | — |
| Expiry date | Mar 31, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a method comprising the step of checking a defect on a surface of a thin film formed by a step or steps of forming the thin film to be an x-ray membrane 12, wherein the thin film is formed by the thin film forming step or steps so that the thin film checked by the defect checking step may have a surface roughness of 1.0 nm or less in terms of Ra (center-line average roughness).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.