Method of fabricating and curing spin-on-glass layers by electron beam irradiation
US5989983A · kind A · utility
41Cited by
5References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 27, 1997 |
| Grant date | Nov 23, 1999 |
| Priority date | — |
| Expiry date | Aug 27, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76801
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An insulating layer may be fabricated on a microelectronic substrate by spinning a layer of spin-on-glass (SOG) on a microelectronic substrate and curing the SOG layer by irradiating the SOG layer with an electronic beam. Irradiating may take place simultaneously with heating the substrate to a temperature below about 500.degree. C. An underlying and/or overlying capping layer may also be provided. Alternatively, rather than irradiating the SOG layer, an overlying capping layer may be irradiated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.