Antireflective coating compositions for photoresist compositions and use thereof
US5994430A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 30, 1997 |
| Grant date | Nov 30, 1999 |
| Priority date | — |
| Expiry date | Apr 30, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to an antireflective coating composition comprising a novel polymer in a solvent composition. The invention further comprises processes for using the antireflective coating composition in photolithography. The antireflective coating composition comprises a novel polymer and a solvent composition, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm and at least one unit that contains no aromatic funtionality. The solvent may be organic, preferrably, a solvent of low toxicity, or it may be water, which may additionally contain other water miscible organic solvents.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.