Microchamber
US5997963A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 5, 1998 |
| Grant date | Dec 7, 1999 |
| Priority date | — |
| Expiry date | May 5, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invented apparatus is a relatively small-volumed chamber useful for processing a substrate. The apparatus includes a reference member with a substantially flat surface. The apparatus also includes a stage member with a surface that supports the substrate, and that has a gas bearing surrounding this support surface. Gas flows through the bearing are regulated to generate a seal of the substrate from ambient gases upon bringing the gas bearing close to the reference member's flat surface. The seal generated by the gas bearing can also be used to contain process gas in proximity to the substrate. Such process gas can be introduced into and exhausted from the chamber through an inlet and outlet, respectively, defined in the reference member. The apparatus can include a window fixed in the reference member. Patterned light or a particle beam can be directed through the window to the contained substrate to cause selective reactions to occur thereon. The gas bearing allows the stage member to be moved relative to the reference member without affecting their relative spacing. Therefore, patterns formed on the substrate can be stepped and repeated without the need for significant refocu…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.