Volatile organometallic compound containing a divalent metal and a group 13 metal, process for preparing same, and process for preparing a heterometallic oxide film using same
US5998644A · kind A · utility
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4Claims
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Key dates
| Filing date | Aug 11, 1998 |
| Grant date | Dec 7, 1999 |
| Priority date | — |
| Expiry date | Aug 11, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/40
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A novel organometallic compound of formula M[(.mu.-OR').sub.2 M'R.sub.2 ].sub.2 can be vaporized at a low temperature and advantageously employed in the CVD of a heterometallic oxide film of the MM'.sub.2 O.sub.4 type, wherein M is a divalent element such as Be, Mg, Zn or Cd; M' is a Group 13 element such as Al or Ga; and R and R' are each independently a C.sub.1-10, alkyl group, with the proviso that if M is Mg, M' is not Al.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.