Patent · US Expired

Method of forming a fiducial for aligning an integrated circuit die

US6001703A · kind A · utility

11Cited by
5References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 26, 1997
Grant dateDec 14, 1999
Priority date
Expiry dateNov 26, 2017

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/975
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A fiducial for aligning an integrated circuit die. In one embodiment, the fiducial is configured to be exposed by laser chemical etching through a silicon substrate through the back side of a C4 packaged integrated circuit die. The presently described fiducial includes floating diffusion regions disposed in the substrate. An oxide layer free of metal contacts is disposed over the diffusion regions within the fiducial region of the integrated circuit. A metal pattern layer is disposed beneath the oxide layer to provide alignment information. The metal pattern layer is configured to be visible through the oxide layer after the silicon substrate has been removed from the fiducial region. A light block is disposed between the metal pattern layer and an underlying epoxy underfill layer to minimize the risk of an excessive amount of light from being exposed to the underlying epoxy layer, which minimizes the risk of the epoxy layer from damaging the integrated circuit from excessive light exposure. Since the presently described fiducial does not include any contacts in the oxide layer, the additional step of utilizing a focus ion beam mills no longer necessary and the presently described …

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.