Cleaning apparatus and a cleaning method
US6003527A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Oct 27, 1997 |
| Grant date | Dec 21, 1999 |
| Priority date | — |
| Expiry date | Oct 27, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
In a cleaning apparatus, a cleaning solution spray means itself is given a function of producing OH.sup.- ionized water and H.sup.+ ionized water and can spray OH.sup.- ionized water and H.sup.+ ionized water, as cleaning solutions immediately after they are produced, upon a substrate to be cleaned, and one of OH.sup.- ionized water and H.sup.+ ionized water can be selectively used as a cleaning solution. This cleaning apparatus includes a substrate holding member for holding a substrate to be cleaned, and a cleaning solution spray member for spraying a cleaning solution upon the substrate. The cleaning solution spray member includes an electrolytic ion generating member for radical-activating or ionizing pure water, and an ultrasonic wave generating member for spraying the radical-activated or ionized pure water, by carrying it on ultrasonic waves, upon the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.