Patent · US Expired

Method for cleaning a semiconductor structure

US6004401A · kind A · utility

4Cited by
3References
18Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMar 2, 1998
Grant dateDec 21, 1999
Priority date
Expiry dateMar 2, 2018

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T137/86348
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A shielding apparatus and method of use for preventing premature entry of a liquid into an overflow drain tube. The shielding apparatus has a shielding member, which may be convex, positioned over an opening of the overflow drain tube. The shielding member deflects airborne liquid and prevents the airborne liquid from passing through the opening. The shielding apparatus also has at least one stem that is inserted through the opening and into the bore of the overflow drain tube. At least one spacer provides a space between at least a portion of the shielding member and a rim that surrounds the opening. The shielding apparatus may be used in a system for cleaning semiconductor structures by preventing liquid from being splashed or projected into the opening of the overflow drain tube. Methods for shielding an overflow drain tube and for cleaning semiconductor structures are also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.