Rapid thermal processing (RTP) system with gas driven rotating substrate

US6005226A · kind A · utility

Assignee

• Steag RTP Systems GmbH · DE

Inventors

• Helmut Aschner · Beimerstetten, DE
• Andreas Hauke · Neu-Ulm, DE
• Ulrich Walk · Ulm, DE
• Dieter Zernickel · Ulm, DE

Key dates

• Filing date: Nov 24, 1997
• Grant date: Dec 21, 1999
• Expiry date: Nov 24, 2017

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6838
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An apparatus, method, and system for Rapid Thermal Processing (RTP), whereby the object to be processed is rotated under the radiation sources of the RTP system by a gas jet system, is presented.