Electron beam microscope using electron beam patterns
US6005247A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 1, 1997 |
| Grant date | Dec 21, 1999 |
| Priority date | — |
| Expiry date | Oct 1, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31779
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam microscope includes an electron beam pattern source, a vacuum enclosure, electron optics, a detector and a processor. The electron beam pattern source generates a sequence of electron beam patterns for illuminating a set of pixels on a specimen. The electron optics directs the sequence of electron beam patterns to the specimen. The detector detects a result of an interaction between each of the electron beam patterns and the specimen and produces a sequence of detector signals. The processor, in response to the sequence of detector signals, generates an image including a pixel value representative of each of the illuminated of pixels on the specimen. The electron beam microscope preferably includes a deflector for deflecting each of the electron beam patterns relative to the specimen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.