Method for forming features using frequency doubling hybrid resist and device formed thereby

US6007968A · kind A · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Toshiharu Furukawa · South Burlington, US
• Mark C. Hakey · Saint Albans, US
• Steven J. Holmes · Colchester, US
• David V. Horak · South Burlington, US
• Paul A. Rabidoux · Winooski, US

Key dates

• Filing date: Oct 29, 1997
• Grant date: Dec 28, 1999
• Expiry date: Oct 29, 2017

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/2022
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The preferred embodiment of the present invention overcomes the limitations of the prior art by providing a method to form unlinked features using hybrid resist. The method uses a trim process in order to trim the linking features from the "loops" formed by the hybrid resist. This allows the method to form a plurality of unlinked features rather than the loops. In order to trim the ends, a relatively larger trim area is formed adjacent the narrow feature line, either by a second exposure step or by utilizing a grey scale reticle. The broader or wider open area allows features to be formed in the narrow feature lines and being trimmed from the relatively large areas, thereby resulting in district features rather than loops.