Patent · US Expired

Stage device, method of controlling same, and exposure apparatus using said stage device

US6008882A · kind A · utility

15Cited by
12References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 2, 1997
Grant dateDec 28, 1999
Priority date
Expiry dateDec 2, 2017

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/707
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A precision stage is provided so as to be movable along the Z axis, in the .theta. direction, which is the direction of rotation about the Z axis, and in two oblique directions inclined with respect to the Z axis. The stage has a sensor for measuring stage position along the Z axis. Reference-position return of this sensor is carried out. Reference-position return of two Y laser interferometers for measuring the .theta. position of the precision stage is carried out in a state in which the positions of the precision stage in the direction along the Z axis and in the oblique directions are held at predetermined reference positions. After this reference-position return is carried out, reference-position return is performed with regard to an X laser interferometer and the two Y laser interferometers in a state in which the positions of the precision stage in the direction along the Z axis, in the oblique directions and in the .theta. direction are held at predetermined reference positions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.