Mirror for providing selective exposure in X-ray lithography
US6009143A · kind A · utility
1Cited by
9References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 8, 1997 |
| Grant date | Dec 28, 1999 |
| Priority date | — |
| Expiry date | Aug 8, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/06
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An inventive mirror system for use in providing reflected X-ray radiation to a mask having pattern areas and opaque areas, comprising a plurality of parallel mirror segments which are vertically positioned with respect to each other at distances approximately equal to the widths of the corresponding opaque mask areas. In operation, radiation incident on each of the mirror segments is reflected to the patterned feature areas of the mask and skips over the opaque mask areas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.