Method and apparatus for preparing a sample for optical analysis and method of controlling the apparatus
US6010637A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 4, 1998 |
| Grant date | Jan 4, 2000 |
| Priority date | — |
| Expiry date | Mar 4, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for preparing a sample for its optical analysis in the manufacture of a semiconductor device includes the step of drying a liquid formed on the semiconductor wafer until the concentration of contaminants contained in the liquid is of a sufficiently high level for the optical analyzer to adequately detect the contaminants. The liquid may be of a film formed on the wafer and dissolved into liquid drops, or deionized water or various chemicals to which the wafer is exposed during a manufacturing process. The apparatus includes a chuck for bringing the wafer into and out of a processing chamber, a guide for guiding the chuck, a piston cylinder for driving the chuck along the guide to a processing position, and a gas supplying system which directs nitrogen gas onto the wafer for drying the liquid. Appropriate controls are provided so that the apparatus can be operated automatically or manually.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.