Microstructure and methods for fabricating such structure
US6015988A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 20, 1998 |
| Grant date | Jan 18, 2000 |
| Priority date | — |
| Expiry date | Nov 20, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D1/043
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for forming a microstructure includes photolithographically forming a vertically extending post on a portion of a surface of a substrate to provide a first structure. A flowable, sacrificial material is deposited over a surface of the first structure. The flowable, sacrificial materially flows off the top surface and sidewall portions of the post onto adjacent portions of the surface of the substrate to provide a second structure. A non-sacrificial material is deposited over a surface of the second structure. The non-sacrificial material is deposited to conform to the surface of the second structure. The non-sacrificial is deposited over the sacrificial material, over the sidewall portions and over the top surface of the post. The deposited sacrificial material is selectively removed while the non-sacrificial material remains to form a third structure with a horizontal member provided by the non-sacrificial material. The horizontal member is supported a predetermined distance above the surface of the substrate by a lower portion of the post. The flowable material is a flowable oxide, for example, hydrogensilsesquioxane glass, and the post has a width less than 20 .mu.m. Th…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.