Process related damage monitor (predator)--systematic variation of antenna parameters to determine charge damage
US6016062A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 11, 1996 |
| Grant date | Jan 18, 2000 |
| Priority date | — |
| Expiry date | Oct 11, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
One embodiment of the instant invention is a test structure (FIGS. 1, 7 and 8) for determining the effect of various process steps on a plurality of devices with regards to charge-induced damage, the test structure comprising: the plurality of devices (device 10 of FIG. 1 and devices of FIGS. 7 and 8), each of the devices includes a plurality of device levels and device structures; a plurality of antennas (antenna 11 of FIG. 1, antennas of FIGS. 7 and 8) for receiving charged particles emitted during a process step, each of the antennas connected to a corresponding portion of the plurality of devices and wherein the antenna and the corresponding portion of the plurality of devices has a perimeter ratio and an antenna ratio; and wherein the perimeter ratios and the antenna ratios are different for different portions of the plurality of antennas and their corresponding portion of the plurality of devices so that the effect of the various process steps with regards to charge-induced damage can be determined.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.