Process depending on plasma discharges sustained by inductive coupling
US6017221A · kind A · utility
47Cited by
11References
7Claims
0Family size
Inventor
Key dates
| Filing date | May 30, 1997 |
| Grant date | Jan 25, 2000 |
| Priority date | — |
| Expiry date | May 30, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A process for fabricating a product 28, 119. The process comprises the steps of subjecting a substrate to a composition of entities, at least one of the entities emanating from a species generated by a gaseous discharge excited by a high frequency field in which the vector sum of phase and anti-phase capacitive coupled voltages from the inductive coupling structure substantially balances.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.