Probe for slurry gas sampling
US6021679A · kind A · utility
6Cited by
4References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 4, 1998 |
| Grant date | Feb 8, 2000 |
| Priority date | — |
| Expiry date | Aug 4, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N7/18
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Device for in-situ collection of a gaseous reaction product from a polishing slurry as a workpiece, such as a semiconductor wafer, is being polished with the slurry, including a probe capable of being placed in contact with the slurry, the probe having a channel for transmitting the gaseous reaction product to an analyzer, a first hydrophobic membrane for allowing passage of the gaseous reaction product from the slurry to the channel, and means for directing a carrier gas through the channel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.