Leping Li
53Patents
18h-index
61Co-inventors
87Inventor score
Filing activity: Dec 20, 1991 → Oct 18, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6126848A | Indirect endpoint detection by chemical reaction and chemiluminescence | Emerging Cross-Sectional Technologies | 464 | Expired |
| US5559428A | In-situ monitoring of the change in thickness of films | Physics | 164 | Expired |
| US6072313A | In-situ monitoring and control of conductive films by detecting changes in induced eddy currents | Physics | 106 | Expired |
| US5660672A | In-situ monitoring of conductive films on semiconductor wafers | Physics | 96 | Expired |
| US5644221A | Endpoint detection for chemical mechanical polishing using frequency or amplitude mode | Physics | 82 | Expired |
| US5731697A | In-situ monitoring of the change in thickness of films | Physics | 62 | Expired |
| US5220405A | Interferometer for in situ measurement of thin film thickness changes | Physics | 49 | Expired |
| US5788801A | Real time measurement of etch rate during a chemical etching process | Electricity | 38 | Expired |
| US6228280A | Endpoint detection by chemical reaction and reagent | Performing Operations; Transporting | 35 | Expired |
| US5659492A | Chemical mechanical polishing endpoint process control | Electricity | 35 | Expired |
| US5392124A | Method and apparatus for real-time, in-situ endpoint detection and closed loop etch process control | Physics | 34 | Expired |
| US5663637A | Rotary signal coupling for chemical mechanical polishing endpoint detection with a westech tool | Electricity | 24 | Expired |
| US6213846A | Real-time control of chemical-mechanical polishing processes using a shaft distortion measurement | Performing Operations; Transporting | 22 | Expired |
| US5381234A | Method and apparatus for real-time film surface detection for large area wafers | Physics | 21 | Expired |
| US5516399A | Contactless real-time in-situ monitoring of a chemical etching | Electricity | 21 | Expired |
| US5338390A | Contactless real-time in-situ monitoring of a chemical etching process | Electricity | 20 | Expired |
| US6276987A | Chemical mechanical polishing endpoint process control | Performing Operations; Transporting | 20 | Expired |
| US5770948A | Rotary signal coupling for chemical mechanical polishing endpoint detection with a strasbaugh tool | Physics | 18 | Expired |
| US5456788A | Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process | Electricity | 15 | Expired |
| US5573624A | Chemical etch monitor for measuring film etching uniformity during a chemical etching process | Electricity | 15 | Expired |
| US5501766A | Minimizing overetch during a chemical etching process | Physics | 13 | Expired |
| US5386121A | In situ, non-destructive CVD surface monitor | Physics | 13 | Expired |
| US5445705A | Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process | Electricity | 12 | Expired |
| US5582746A | Real time measurement of etch rate during a chemical etching process | Electricity | 12 | Expired |
| US5500073A | Real time measurement of etch rate during a chemical etching process | Electricity | 10 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.