Device and method for fragmenting semiconductor material
US6024306A · kind A · utility
6Cited by
4References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 23, 1998 |
| Grant date | Feb 15, 2000 |
| Priority date | — |
| Expiry date | Jun 23, 2018 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB02C2019/183
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method and device for fragmenting semiconductor material, comprising at least two spaced-apart electrodes, which consist of the semiconductor material which is to be fragmented. Each electrode has a heating device. The electrodes pass high voltage current through the semiconductor material to fragment it. The device eliminates the risk of contanimation of the semiconductor material as compared with conventional methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.