Patent · US Expired

Device and method for fragmenting semiconductor material

US6024306A · kind A · utility

6Cited by
4References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 23, 1998
Grant dateFeb 15, 2000
Priority date
Expiry dateJun 23, 2018

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB02C2019/183
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A method and device for fragmenting semiconductor material, comprising at least two spaced-apart electrodes, which consist of the semiconductor material which is to be fragmented. Each electrode has a heating device. The electrodes pass high voltage current through the semiconductor material to fragment it. The device eliminates the risk of contanimation of the semiconductor material as compared with conventional methods.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.