Negative-type resist composition and process for forming resist patterns
US6027856A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 19, 1999 |
| Grant date | Feb 22, 2000 |
| Priority date | — |
| Expiry date | Mar 19, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A negative-type resist composition which is developable in a basic aqueous solution, which comprises a film-formable, basic aqueous solution-soluble polymer with an alkali-soluble group, a compound with an allyl alcohol structure and a photoacid generator which when decomposed by absorption of image-forming radiation causes the compound with an allyl alcohol structure to become a protecting group for the alkali-soluble group, as well as a resist pattern-forming process which employs it. A basic aqueous solution can be used as the developing solution, and it is possible to form intricate patterns with a practical sensitivity and no swelling.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.