Positioning apparatus and exposure apparatus using the same
US6028376A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 1998 |
| Grant date | Feb 22, 2000 |
| Priority date | — |
| Expiry date | Apr 17, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T74/20201
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positioning apparatus includes a movable stage, a first linear motor for moving the stage in a predetermined direction, a platform for supporting the first linear motor, and an inertial force application mechanism for applying a force for canceling a force acting on the platform, which is generated when the stage is moved by the first linear motor. The inertial force application mechanism includes amass body, a guide for supporting and guiding the mass body, a second linear motor for moving the mass body, and a controller for controlling the second linear motor. Since the inertial force application mechanism of the positioning apparatus prevents transmission of vibration generated by an increase in an exciting force of the stage, rapid and precise positioning can be performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.