Patent · US Expired

Method for manufacturing dielectric capacitor, dielectric memory device

US6033953A · kind A · utility

43Cited by
2References
25Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 16, 1997
Grant dateMar 7, 2000
Priority date
Expiry dateDec 16, 2017

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/32115
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A dielectric capacitor is provided which has a reduced leakage current. The surface of a first electrode (38) of the capacitor is electropolished and a dielectric film (40) and a second electrode (37) are successively laminated on it. The convex parts pointed end (38a) existing on the surface of the first electrode is very finely polished uniformly by dissolving according to electropolishing, a spherical curved surface in which the radius of curvature has been enlarged is formed, and the surface of the first electrode is flattened. Therefore, concentration of electrolysis can be prevented during the operation at the interface of the first electrode and the dielectric film, and the leakage current can be reduced considerably.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.