Apparatus for guiding air current in a wafer loading chamber for chemical vapor deposition equipment
US6036781A · kind A · utility
18Cited by
12References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 1997 |
| Grant date | Mar 14, 2000 |
| Priority date | — |
| Expiry date | Mar 19, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/137
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An air current guiding apparatus includes a plurality of dampers installed on a filter unit on an inner wall of air supply unit for blowing clean air over wafers loaded in a boat for transfer to a reaction chamber for chemical vapor deposition. Each of the dampers has a certain length and angular orientation to force the air in a designated direction so that the air current in a wafer loading chamber maintains an appropriate velocity and is free from air turbulence, thereby minimizing the number of contaminating particles in the wafer loading chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.